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Featured articles
Vacuum in PVD (physical vapor deposition)
Vacuum in PVD Processes: Purpose, Measurement, and Management In the context of PVD processes, vacuum indicates the condition in which the pressure inside the deposition chamber is reduced to…
PECVD: Plasma Enhanced Chemical Vapour Deposition
PECVD: what it is, how it works, and differences from standard thermal CVD PECVD (Plasma Enhanced Chemical Vapour Deposition) is a deposition technique in which precursor gases are introduced into…
Thermal evaporation: principle, limits, and comparisons
What is thermal evaporation? Thermal evaporation is one of the fundamental techniques of PVD (Physical Vapour Deposition): the source material is heated to its evaporation temperature, releasing…
All articles
Vacuum in PVD (physical vapor deposition)
Vacuum is the enabling condition for PVD: it determines film quality, deposit purity, and treatment repeatability.…
PECVD: Plasma Enhanced Chemical Vapour Deposition
PECVD: plasma-enhanced chemical vapour deposition at reduced temperatures, for functional coatings with controllable…
Thermal evaporation: principle, limits, and comparisons
Thermal evaporation in PVD: how it works, which materials it supports, and why mean free path and crucible are critical…
Reactive deposition: PVD with reactive gas
What reactive PVD deposition is, how the reactive gas interacts with the target, and why stoichiometry determines the…
PVD Target: what it is, source material, geometry, and thermal management
Discover what a PVD target is, the source materials used, geometry options, and the importance of thermal management in…
Cathodic Arc Deposition: Definition, Process, and Main Industrial Applications
Cathodic arc deposition: working principle, coating properties, anti-wear applications, and management of surface…